CD Module For Critical Dimension Metrology

Optical microscopy software tool adding Critical Dimension Metrology to PAX-it Image Analysis Software

 

Features of this tool include:

  • Fast and repeatable measurement tool, available stand-alone or as an upgrade to any optical microscope
  • Set critical dimension measurements to inside edges, outside edges, or pitch measurements
  • Select a desired % threshold target
  • Optical Profile display may be configured by the user, allowing easy viewing of edges and thresholds
  • Once a Critical Dimension Measurement Test is defined, it may be saved for repeated use on additional images
  • Measure horizontal, vertical, and curved critical dimensions with reliability and repeatability
  • Multiple-pass measurements allow for multiple automatic measurements within a single field of view
  • View your measurement data on screen, or generate a customizable full report in MS Word®, MS Excel®
  • Fully automated focus – capture – archive – measure – and report sequence can be obtained with the optional Motorized Stage Module and Scripting
  • Critical Dimension Metrology of SEM images.  The PAXit! Scripting Module allows batch imports of unlimited numbers of SEM images to be automatically CD measured upon import to PAX-it!
  • Ideal for process control in photolithography and related applications in Semiconductor, MEMS, Microfluidics, LED, LCD, Flat Panel Display, Photovoltaic / Solar, and similar technologies

semiconductor critical dimension analysis

 


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